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vendorOxford Instruments

typeOxford PlasmaPro100 Cobra

extensionsICP

applicationEtching
RIE systems

ownerAMOLF NanoLab

relevant informationAvailable chemistries: CHF3, SF6, O2, Ar, C4F8, CF4, HBr, Cl2. Specimen: up to wafer 100 mm