IXA
Amsterdam Research Facilities

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vendorRaith

typeRaith Voyager

extensionsstiching free modes Traxx and periodixx, large area

applicationLithography
E-beam

ownerAMOLF NanoLab

relevant informationNano structuring photoresist; writing structures of >10 nm in positive (PMMA) or negative (HSQ) resists. Specimen: up to wafer 100 mm